Impact of seed layer on material quality of epitaxial germanium on silicon deposited by low pressure chemical vapor deposition
| Autor: | Olubuyide, Oluwamuyiwa O., Danielson, David T., Kimerling, Lionel C., Hoyt, Judy L. |
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| Zdroj: | In Thin Solid Films 2006 508(1):14-19 |
| Databáze: | ScienceDirect |
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