Multi-technique characterization of tantalum oxynitride films prepared by reactive direct current magnetron sputtering
| Autor: | Venkataraj, S., Kittur, H., Drese, R., Wuttig, M. |
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| Zdroj: | In Thin Solid Films 2006 514(1):1-9 |
| Databáze: | ScienceDirect |
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