Effects of plasma treatments on structural and electrical properties of methyl-doped silicon oxide low dielectric constant film
| Autor: | Leong, W.Y., Tsang, C.F., Li, H.Y., Bliznetsov, V., Wong, L.Y., Li, W.H. |
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| Zdroj: | In Thin Solid Films 2006 496(2):402-411 |
| Databáze: | ScienceDirect |
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