The structures and properties of a-C:H films deposited at a wide range of relative hydrogen gas flow rate by RF sputtering
| Autor: | Oshiro, T., Begum, F., Yamazato, M., Higa, A., Maehama, T., Toguchi, M. |
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| Zdroj: | In Thin Solid Films 2006 506:92-95 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect