Plasma enhanced chemical vapor deposition of nitrogen-incorporated silicon oxide films using TMOS/N 2O gas
| Autor: | Kang, M.S., Chung, T.H., Kim, Y. |
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| Zdroj: | In Thin Solid Films 2006 506:45-49 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
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| Autor: | Kang, M.S., Chung, T.H., Kim, Y. |
|---|---|
| Zdroj: | In Thin Solid Films 2006 506:45-49 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
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Full Text from ScienceDirect