Plasma enhanced chemical vapor deposition of nitrogen-incorporated silicon oxide films using TMOS/N 2O gas
Autor: | Kang, M.S., Chung, T.H., Kim, Y. |
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Zdroj: | In Thin Solid Films 2006 506:45-49 |
Databáze: | ScienceDirect |
Externí odkaz: |
Autor: | Kang, M.S., Chung, T.H., Kim, Y. |
---|---|
Zdroj: | In Thin Solid Films 2006 506:45-49 |
Databáze: | ScienceDirect |
Externí odkaz: |