Optimization of Al-CVD process based on elementary reaction simulation and experimental verification: From the growth rate to the surface morphology
| Autor: | Sugiyama, Masakazu, Iino, Tomohisa, Nakajima, Tohru, Tanaka, Takeshi, Egashira, Yasuyuki, Yamashita, Kohichi, Komiyama, Hiroshi, Shimogaki, Yukihiro |
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| Zdroj: | In Thin Solid Films 2006 498(1):30-35 |
| Databáze: | ScienceDirect |
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