Uniformity and stoichiometry of large-area multicomponent oxide thin films deposited by sputtering
| Autor: | Tao, B.W., Chen, J.J., Liu, X.Z., Li, Y.R., Fromknecht, R., Geerk, J. |
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| Zdroj: | In Thin Solid Films 2005 485(1):47-52 |
| Databáze: | ScienceDirect |
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