Defect passivation in chemical vapour deposited fine-grained polycrystalline silicon by plasma hydrogenation
| Autor: | Carnel, L., Gordon, I., Van Nieuwenhuysen, K., Van Gestel, D., Beaucarne, G., Poortmans, J. |
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| Zdroj: | In Thin Solid Films 2005 487(1):147-151 |
| Databáze: | ScienceDirect |
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