Engineering structure and properties of hafnium oxide films by atomic layer deposition temperature
| Autor: | Kukli, Kaupo *, Aarik, Jaan, Uustare, Teet, Lu, Jun, Ritala, Mikko, Aidla, Aleks, Pung, Lembit, Hårsta, Anders, Leskelä, Markku, Kikas, Arvo, Sammelselg, Väino |
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| Zdroj: | In Thin Solid Films 2005 479(1):1-11 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect