Investigation of deposition characteristics and properties of high-rate deposited silicon nitride films prepared by atmospheric pressure plasma chemical vapor deposition
| Autor: | Kakiuchi, H. *, Nakahama, Y., Ohmi, H., Yasutake, K., Yoshii, K., Mori, Y. |
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| Zdroj: | In Thin Solid Films 2005 479(1):17-23 |
| Databáze: | ScienceDirect |
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