Improvement of ZnO TCO film growth for photovoltaic devices by reactive plasma deposition (RPD)
| Autor: | Iwata, K. *, Sakemi, T., Yamada, A., Fons, P., Awai, K., Yamamoto, T., Shirakata, S., Matsubara, K., Tampo, H., Sakurai, K., Ishizuka, S., Niki, S. |
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| Zdroj: | In Thin Solid Films 2005 480:199-203 |
| Databáze: | ScienceDirect |
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