The structural and dielectric properties of SiO x/a-C,F/SiO x multi-layer thin films deposited by microwave electron cyclotron resonance plasma method
| Autor: | Xin, Y. *, Ning, Z.Y., Ye, C., Xu, S.H., Chen, J., Lu, X.H. |
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| Zdroj: | In Thin Solid Films 2005 472(1):44-48 |
| Databáze: | ScienceDirect |
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