Infrared spectroscopic ellipsometry applied to the characterization of ultra shallow junction on silicon and SOI
| Autor: | Defranoux, C. *, Emeraud, T., Bourtault, S., Venturini, J., Boher, P., Hernandez, M., Laviron, C., Noguchi, T. |
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| Zdroj: | In Thin Solid Films 2004 455:150-156 |
| Databáze: | ScienceDirect |
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