Influence of Si(1 0 0) surface pretreatment on the morphology of TiO 2 films grown by atomic layer deposition

Autor: Finnie, K.S. *, Triani, G., Short, K.T., Mitchell, D.R.G., Attard, D.J., Bartlett, J.R., Barbé, C.J.
Zdroj: In Thin Solid Films 2003 440(1):109-116
Databáze: ScienceDirect