Characterization of Cat-CVD grown Si–C and Si–C–O dielectric films for ULSI applications
| Autor: | Takatsuji, K., Kawakami, M., Makita, Y., Murakami, K., Nakayama, H. *, Miura, Y., Shimoyama, N., Machida, H. |
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| Zdroj: | In Thin Solid Films 2003 430(1):116-119 |
| Databáze: | ScienceDirect |
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