High deposition rate of epitaxial (1 0 0) Iridium film on (1 0 0)YSZ/(1 0 0)Si substrate by RF sputtering deposition
| Autor: | Khoa, Tran Dang *, Horii, Sadayoshi, Horita, Susumu |
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| Zdroj: | In Thin Solid Films 2002 419(1):88-94 |
| Databáze: | ScienceDirect |
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