Effects of nitrogen flow rates on the growth morphology of TiAlN films prepared by an rf-reactive sputtering technique
| Autor: | Chakrabarti, K., Jeong, J.J., Hwang, S.K., Yoo, Y.C., Lee, C.M. * |
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| Zdroj: | In Thin Solid Films 2002 406(1):159-163 |
| Databáze: | ScienceDirect |
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