Thin film atomic layer deposition equipment for semiconductor processing
| Autor: | Sneh, Ofer *, Clark-Phelps, Robert B, Londergan, Ana R, Winkler, Jereld, Seidel, Thomas E |
|---|---|
| Zdroj: | In Thin Solid Films 2002 402(1):248-261 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect