The use of in situ X-ray diffraction, optical scattering and resistance analysis techniques for evaluation of copper diffusion barriers in blanket films and damascene structures

Autor: Cabral Jr, C *, Lavoie, C, Harper, J.M.E, Jordan-Sweet, J
Zdroj: In Thin Solid Films 2001 397(1):194-202
Databáze: ScienceDirect