Hot-wire chemical vapor deposition (HWCVD) of fluorocarbon and organosilicon thin films
| Autor: | Lau, K.K.S, Pryce Lewis, H.G, Limb, S.J, Kwan, M.C, Gleason, K.K * |
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| Zdroj: | In Thin Solid Films 3 September 2001 395(1-2):288-291 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect