Depth profiling and the effect of oxygen and carbon on the photoelectrical properties of amorphous silicon films deposited using tungsten wire filaments
| Autor: | Persheyev, S.K *, Goldie, D.M, Gibson, R.A.G, Rose, M.J, Anthony, S, Keeble, D.J, Robb, K, Main, C, Reynolds, S, Zrinscak, I |
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| Zdroj: | In Thin Solid Films 3 September 2001 395(1-2):130-133 |
| Databáze: | ScienceDirect |
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