High rate deposition of TiO 2 and SiO 2 films by radical beam assisted deposition (RBAD)
| Autor: | Harada, Takahiro *, Yamada, Yasumi, Uyama, Haruo, Murata, Takanori, Nozoye, Hisakazu |
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| Zdroj: | In Thin Solid Films 2001 392(2):191-195 |
| Databáze: | ScienceDirect |
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