Microwave plasma enhanced CVD of aluminum oxide films: OES diagnostics and influence of the RF bias
| Autor: | Tristant, P. *, Ding, Z., Trang Vinh, Q.B., Hidalgo, H., Jauberteau, J.L., Desmaison, J., Dong, C. |
|---|---|
| Zdroj: | In Thin Solid Films 2001 390(1):51-58 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect