Low temperature formation of microcrystalline silicon films using high-density SiH 4 microwave plasma
| Autor: | Sakuma, Yoshikazu, Liu, Haiping, Shirai, Hajime *, Moriya, Yoshimizu, Ueyama, Hiroyuki |
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| Zdroj: | In Thin Solid Films 2001 386(2):261-266 |
| Databáze: | ScienceDirect |
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