Theoretical study of penetration reaction of fluorine atoms and ions into hydrogen-terminated Si(111) thin film
| Autor: | Makino, Osamu, Sakata, Ken, Yamazaki, Hiroki, Iguchi, Keinosuke, Tachibana, Akitomo * |
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| Zdroj: | In Thin Solid Films 2000 374(2):143-149 |
| Databáze: | ScienceDirect |
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