Step-by-step growth of an epitaxial Si4O5N3 single layer on SiC(0001) in ultrahigh vacuum
Autor: | Mizuno, Seigi, Matsuo, Tomomi, Nakagawa, Takeshi |
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Zdroj: | In Surface Science July 2017 661:22-27 |
Databáze: | ScienceDirect |
Externí odkaz: |
Autor: | Mizuno, Seigi, Matsuo, Tomomi, Nakagawa, Takeshi |
---|---|
Zdroj: | In Surface Science July 2017 661:22-27 |
Databáze: | ScienceDirect |
Externí odkaz: |