In-situ non-disruptive cleaning of Ge(100) using H2O2(g) and atomic hydrogen
| Autor: | Kaufman-Osborn, Tobin, Kiantaj, Kiarash, Chang, Chorng-Ping, Kummel, Andrew C. |
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| Zdroj: | In Surface Science December 2014 630:254-259 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect