Diffusion and chemical composition of TiN xO y thin films studied by Rutherford Backscattering Spectroscopy

Autor: Drogowska, K., Kim-Ngan, N.-T.H., Balogh, A.G., Radecka, M., Brudnik, A., Zakrzewska, K., Tarnawski, Z.
Zdroj: In Surface Science 2010 604(11):1010-1014
Databáze: ScienceDirect