Diffusion and chemical composition of TiN xO y thin films studied by Rutherford Backscattering Spectroscopy
Autor: | Drogowska, K., Kim-Ngan, N.-T.H., Balogh, A.G., Radecka, M., Brudnik, A., Zakrzewska, K., Tarnawski, Z. |
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Zdroj: | In Surface Science 2010 604(11):1010-1014 |
Databáze: | ScienceDirect |
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