Investigating the lateral motion of SiGe islands by selective chemical etching
| Autor: | Katsaros, G., Rastelli, A., Stoffel, M., Isella, G., Känel, H. von, Bittner, A.M., Tersoff, J., Denker, U., Schmidt, O.G., Costantini, G., Kern, K. |
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| Zdroj: | In Surface Science 2006 600(12):2608-2613 |
| Databáze: | ScienceDirect |
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