Halogen chemisorption, the pairwise diffusion of I, and trapping by defects on Si(1 0 0)
| Autor: | Xu, G.J., Signor, A.W., Agrawal, Abhishek, Nakayama, Koji S., Trenhaile, B.R., Weaver, J.H. |
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| Zdroj: | In Surface Science 2005 577(1):77-85 |
| Databáze: | ScienceDirect |
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