Investigation of the chemical state of ultrathin Hf–Al–O films during high temperature annealing
| Autor: | Cho, M.-H., Chang, H.S., Cho, Y.J., Moon, D.W., Min, K.-H., Sinclair, R., Kang, S.K., Ko, D.-H., Lee, J.H., Gu, J.H., Lee, N.I. |
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| Zdroj: | In Surface Science 2004 554(1):L75-L80 |
| Databáze: | ScienceDirect |
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