Computed energetics for etching of the Si( [formula omitted]) surface by F and Cl atoms
| Autor: | Walch, Stephen P. |
|---|---|
| Zdroj: | In Surface Science 2002 496(3):271-286 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
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| Autor: | Walch, Stephen P. |
|---|---|
| Zdroj: | In Surface Science 2002 496(3):271-286 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
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Full Text from ScienceDirect