Conditions of ion implantation into thin amorphous Si gate layers for suppressing threshold voltage shift
| Autor: | Suzuki, Kunihiro *, Sudo, Ritsuo |
|---|---|
| Zdroj: | In Solid State Electronics 2000 44(6):1043-1047 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
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| Autor: | Suzuki, Kunihiro *, Sudo, Ritsuo |
|---|---|
| Zdroj: | In Solid State Electronics 2000 44(6):1043-1047 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect