TEM studies of the microstructure evolution in plasma treated CVD TiN thin films used as diffusion barriers
| Autor: | Ikeda, S, Palleau, J, Torres, J, Chenevier, B *, Bourhila, N, Madar, R |
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| Zdroj: | In Solid State Electronics 1999 43(6):1063-1068 |
| Databáze: | ScienceDirect |
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