Unveiling the mechanism behind the negative capacitance effect in Hf0.5Zr0.5O2-Based ferroelectric gate stacks and introducing a Circuit-Compatible hybrid compact model for Leakage-Aware NCFETs

Autor: Singh, Khoirom Johnson, Acharya, Lomash Chandra, Bulusu, Anand, Dasgupta, Sudeb
Zdroj: In Solid State Electronics June 2024 216
Databáze: ScienceDirect