Analysis of ferroelectric properties of ALD-Hf0.5Zr0.5O2 thin films according to oxygen sources
| Autor: | Lee, Seungbin, Jung, Yong Chan, Park, Hye Ryeon, Park, Seongbin, Kang, Jongmug, Jeong, Juntak, Choi, Yeseo, Kim, Jin-Hyun, Mohan, Jaidah, Kim, Harrison Sejoon, Kim, Jiyoung, Kim, Si Joon |
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| Zdroj: | In Solid State Electronics June 2024 216 |
| Databáze: | ScienceDirect |
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