28 nm FD-SOI MEOL parasitic capacitance segmentation using electrical testing and semiconductor process modeling
| Autor: | Vianne, B., Guillo-Lohan, B., Quenette, V., Legoix, B., Vincent, B. |
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| Zdroj: | In Solid State Electronics February 2023 200 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect