High-quality remote plasma enhanced atomic layer deposition of aluminum oxide thin films for nanoelectronics applications
| Autor: | Khosla, Robin, Schwarz, Daniel, Funk, Hannes S., Guguieva, Kateryna, Schulze, Jörg |
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| Zdroj: | In Solid State Electronics November 2021 185 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect