Improvement of contact resistance in flexible a-IGZO thin-film transistors by CF4/O2 plasma treatment
| Autor: | Knobelspies, S., Takabayashi, A., Daus, A., Cantarella, G., Münzenrieder, N., Tröster, G. |
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| Zdroj: | In Solid State Electronics December 2018 150:23-27 |
| Databáze: | ScienceDirect |
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