Process optimization and device variation of Mg-doped ZnO FBARs
Autor: | Duan, Franklin Li, Yang, Zhi, Ji, Zhonglin, Weng, Haotian, Xie, Ziyi, Shen, Allegro, Mi, Shijie, Chen, Xi, Chen, Yigang, Liu, Qianhui |
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Zdroj: | In Solid State Electronics January 2019 151:11-17 |
Databáze: | ScienceDirect |
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