Process optimization and device variation of Mg-doped ZnO FBARs

Autor: Duan, Franklin Li, Yang, Zhi, Ji, Zhonglin, Weng, Haotian, Xie, Ziyi, Shen, Allegro, Mi, Shijie, Chen, Xi, Chen, Yigang, Liu, Qianhui
Zdroj: In Solid State Electronics January 2019 151:11-17
Databáze: ScienceDirect