Impact of residual defects caused by extension ion implantation in FinFETs on parasitic resistance and its fluctuation

Autor: Matsukawa, Takashi, Liu, Yongxun, Mori, Takahiro, Morita, Yukinori, Otsuka, Shintaro, O'uchi, Shin-ichi, Fuketa, Hiroshi, Migita, Shinji, Masahara, Meishoku
Zdroj: In Solid State Electronics June 2017 132:103-108
Databáze: ScienceDirect