Two-step annealing effects on ultrathin EOT higher-k (k = 40) ALD-HfO2 gate stacks
| Autor: | Morita, Yukinori, Migita, Shinji, Mizubayashi, Wataru, Masahara, Meishoku, Ota, Hiroyuki |
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| Zdroj: | In Solid State Electronics June 2013 84:58-64 |
| Databáze: | ScienceDirect |
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