AlGaN/GaN heterostructure field-effect transistors with multi-MgxNy/GaN buffer and Photo-CVD SiO2 gate dielectric

Autor: Lee, K.H., Chang, P.C., Chang, S.J., Su, Y.K.
Zdroj: In Solid State Electronics June 2012 72:38-43
Databáze: ScienceDirect