New method to calibrate the pattern dependency of selective epitaxy of SiGe layers
| Autor: | Kolahdouz, M., Maresca, L., Ostling, M., Riley, D., Wise, R., Radamson, H.H. |
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| Zdroj: | In Solid State Electronics 2009 53(8):858-861 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect