Performance improvement in narrow MuGFETs by gate work function and source/drain implant engineering
| Autor: | Ferain, I., Duffy, R., Collaert, N., van Dal, M.J.H., Pawlak, B.J., O’Sullivan, B., Witters, L., Rooyackers, R., Conard, T., Popovici, M., van Elshocht, S., Kaiser, M., Weemaes, R.G.R., Swerts, J., Jurczak, M., Lander, R.J.P., De Meyer, K. |
|---|---|
| Zdroj: | In Solid State Electronics 2009 53(7):760-766 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect