All hot wire CVD TFTs with high deposition rate silicon nitride (3 nm/s)
| Autor: | Schropp, R.E.I., Nishizaki, S., Houweling, Z.S., Verlaan, V., van der Werf, C.H.M., Matsumura, H. |
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| Zdroj: | In Solid State Electronics 2008 52(3):427-431 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect