Structural and electrical characterization of Al 2O 3/HfO 2/Al 2O 3 on strained SiGe
| Autor: | Wu, D. *, Lu, J., Vainonen-Ahlgren, E., Tois, E., Tuominen, M., Östling, M., Zhang, S.-L. |
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| Zdroj: | In Solid State Electronics 2005 49(2):193-197 |
| Databáze: | ScienceDirect |
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