Comparison of sub-micron Si:SiGe heterojunction nFETs to Si nMOSFET in present-day technologies
| Autor: | Fobelets, K., Jeamsaksiri, W., Papavasilliou, C., Vilches, T., Gaspari, V., Velazquez-Perez, J.E., Michelakis, K., Hackbarth, T., König, U. |
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| Zdroj: | In Solid State Electronics 2004 48(8):1401-1406 |
| Databáze: | ScienceDirect |
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