In situ phosphorus-doped polycrystalline silicon films by low pressure chemical vapor deposition for contact passivation of silicon solar cells

Autor: Fırat, Meriç, Sivaramakrishnan Radhakrishnan, Hariharsudan, Recamán Payo, María, Duerinckx, Filip, Tous, Loic, Poortmans, Jef
Zdroj: In Solar Energy 1 January 2022 231:78-87
Databáze: ScienceDirect