Correlation between microstructure and properties of hydrogenated Si thin films grown by plasma enhanced chemical vapor deposition under different hydrogen flow rates

Autor: Amor, Sana Ben, Bousbih, Rabaa, Ouertani, Rachid, Dimassi, Wissem, Ezzaouia, Hatem
Zdroj: In Solar Energy May 2014 103:12-18
Databáze: ScienceDirect